The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2021

Filed:

Oct. 06, 2016
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Thomas H. Baum, New Fairfield, CT (US);

Yuqi Li, Danbury, CT (US);

David James Eldridge, Liberty Hill, TX (US);

Robert L. Wright, Newtown, CT (US);

Assignee:

Entegris, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 1/00 (2006.01); C23C 16/448 (2006.01); C04B 35/00 (2006.01); B22F 3/02 (2006.01); C04B 35/515 (2006.01); C04B 35/63 (2006.01); C04B 35/634 (2006.01); C09D 5/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4481 (2013.01); B22F 3/02 (2013.01); C04B 35/00 (2013.01); C04B 35/5152 (2013.01); C04B 35/6303 (2013.01); C04B 35/634 (2013.01); C09D 1/00 (2013.01); C09D 5/00 (2013.01); C23C 16/448 (2013.01); C04B 2235/444 (2013.01); C04B 2235/604 (2013.01);
Abstract

A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.


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