The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Aug. 14, 2018
Lam Research Corporation, Fremont, CA (US);
Akhil Singhal, Beaverton, OR (US);
Nader Shamma, Cupertino, CA (US);
Dustin Zachary Austin, Corvallis, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for improving EUV lithographic patterning of SnOlayers is provided. One method embodiment includes introducing a hydrophobic surface treatment compound into a processing chamber for modifying a surface of an SnOlayer. The modification increases the hydrophobicity of the SnOlayer. The method also provides for depositing a photoresist layer on the surface of the SnOlayer via spin coating. The modification of the surface of the SnOlayer enhances adhesion of contact between the photoresist and the SnOlayer during and after spin coating.