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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11029600 B1

PDFFull Text
Date of Patent:
Jun. 08, 2021

Filed:

Aug. 08, 2019

Resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Takehito Seo, Kawasaki, JP;

Tomoyuki Hirano, Kawasaki, JP;

Yuta Iwasawa, Kawasaki, JP;

Yusuke Itagaki, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John A McPherson

Assistant Examiner:

Nicholas E Brown

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08F 220/28 (2006.01); G03F 7/20 (2006.01); C08F 220/16 (2006.01); C08F 220/36 (2006.01); G03F 7/16 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 220/16 (2013.01); C08F 220/28 (2013.01); C08F 220/36 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); C08F 220/283 (2020.02); C08F 220/365 (2020.02); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

A resist composition including a resin component having more than 30 mol % of a structural unit represented by formula (a0-1), and an acid generator represented by formula (b1) in which Rrepresents a hydrogen atom, an alkyl group or a halogenated alkyl group; Varepresents an alkylene group; Rarepresents an acid dissociable group; Rrepresents an cyclic hydrocarbon group; Lrepresents —O—C(═O)— or —C(═O)—O—; Yrepresents a divalent linking group or a single bond; Vrepresents a fluorinated alkylene group; Rrepresents a fluorine atom or a hydrogen atom; provided that the total number of fluorine atoms contained in Vand Ris 2 or 3; and Mrepresents an m-valent organic cation.

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