The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Oct. 25, 2016
Applicant:
Ev Group E. Thallner Gmbh, St. Florian am Inn, AT;
Inventor:
Gerald Mittendorfer, Stuben, AT;
Assignee:
EV Group E. Thallner GmbH, St. Florian am Inn, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 63/00 (2006.01); B32B 27/38 (2006.01); B32B 27/28 (2006.01); B32B 27/34 (2006.01); B32B 27/30 (2006.01); B32B 3/30 (2006.01); B32B 27/06 (2006.01); H01L 23/31 (2006.01); B32B 7/12 (2006.01); H05K 3/00 (2006.01); B32B 27/08 (2006.01); B32B 9/04 (2006.01); B32B 27/16 (2006.01); B32B 7/06 (2019.01);
U.S. Cl.
CPC ...
B29C 63/0013 (2013.01); B32B 3/30 (2013.01); B32B 7/06 (2013.01); B32B 7/12 (2013.01); B32B 9/04 (2013.01); B32B 27/06 (2013.01); B32B 27/08 (2013.01); B32B 27/16 (2013.01); B32B 27/281 (2013.01); B32B 27/283 (2013.01); B32B 27/285 (2013.01); B32B 27/308 (2013.01); B32B 27/34 (2013.01); B32B 27/38 (2013.01); H01L 23/3135 (2013.01); H05K 3/0079 (2013.01); B29C 2063/006 (2013.01); B32B 2250/44 (2013.01); B32B 2307/51 (2013.01); B32B 2307/714 (2013.01); B32B 2307/748 (2013.01); B32B 2457/14 (2013.01); H05K 3/007 (2013.01); H05K 3/0085 (2013.01); H05K 3/0097 (2013.01); H05K 2203/0769 (2013.01); H05K 2203/1361 (2013.01); H05K 2203/1366 (2013.01); H05K 2203/1383 (2013.01); H05K 2203/1545 (2013.01); H05K 2203/1563 (2013.01);
Abstract
A method for treating a substrate having millimeter and/or micrometer and/or nanometer structures. The method includes applying at least one protective material to the structures, wherein the at least one protective material can be dissolved in a solvent, and the structures are produced by an imprinting process.