The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Mar. 06, 2020
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Ali Afzali-Ardakani, Ossining, NY (US);
Benjamin Wymore, Cortlandt Manor, NY (US);
David L. Rath, Stormville, NY (US);
George G. Totir, Newtown, CT (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/306 (2006.01); C09K 13/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); C09K 13/08 (2013.01); H01L 21/30604 (2013.01);
Abstract
Enhanced compositions and methods are provided for selectively etching silicon wafers, which is particularly useful in the context of silicon wafer manufacturing and processing applications. Optionally, a formulation is provided which selectively etches silicon dioxide in preference to aluminum oxide. Optionally, a formulation and method are provided that is substantially non-aqueous.