The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Nov. 25, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Fahong Li, Eindhoven, NL;
Sergei Sokolov, Utrecht, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/27 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70641 (2013.01); G01B 11/272 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01);
Abstract
Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data.