The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Oct. 22, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Jan Willem Maes, Wilrijk, BE;
Krzysztof Kamil Kachel, Chandler, AZ (US);
David Kurt de Roest, Kessel-Lo, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0043 (2013.01); G03F 7/0042 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/70033 (2013.01); G03F 7/70808 (2013.01);
Abstract
The method relates to a method of forming an enhanced unexposed photoresist layer from an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed photoresist to exposure radiation. The method comprises: providing the substrate with the unexposed photoresist layer in a reaction chamber; providing a first precursor comprising a portion of a photosensitizer sensitive to exposure radiation in the reaction chamber; and, infiltrating the unexposed photoresist layer on the substrate with the first precursor.