The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2021
Filed:
Jul. 25, 2017
Applicant:
Hitachi Chemical Dupont Microsystems, Ltd., Tokyo, JP;
Inventors:
Ayaka Azuma, Hitachi, JP;
Satoshi Abe, Hitachi, JP;
Kazuya Soejima, Hitachi, JP;
Masato Nishimura, Tokyo, JP;
Tadamitsu Nakamura, Hitachi, JP;
Assignee:
HD MICROSYSTEMS, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/10 (2006.01); C08G 73/22 (2006.01); G03F 7/023 (2006.01); G03F 7/022 (2006.01); G03F 7/085 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
C08G 73/10 (2013.01); C08G 73/1071 (2013.01); C08G 73/22 (2013.01); G03F 7/023 (2013.01); G03F 7/0226 (2013.01); G03F 7/0233 (2013.01); G03F 7/0387 (2013.01); G03F 7/085 (2013.01);
Abstract
Provided is a photosensitive resin composition containing; (A) a polymer having an acidic functional group or a substituent derived therefrom; (B) a photoreactive compound; (C) a solvent; and (D) a nitrogen-containing aromatic compound represented by the following general formula (1).