The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Nov. 22, 2016
Asml Netherlands B.v., Veldhoven, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Omer Abubaker Omer Adam, Eindhoven, NL;
Adrianus Cornelis Matheus Koopman, Hilversum, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Arie Jeffrey Den Boef, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method and a computer program product that relates to lithographic apparatuses and, processes, and more particularly to a method and computer program to inspect substrates produced by the lithographic apparatuses and processes. The method and/or computer program product includes determining contributions from independent sources from results measured from a lithography process or a substrate processed by the lithography process, wherein the results are measured using a plurality of different substrate measurement recipes.