The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Jul. 09, 2019
Methods and apparatus for high resolution imaging with reflectors at staggered depths beneath sample
Massachusetts Institute of Technology, Cambridge, MA (US);
Barmak Heshmat Dehkordi, San Mateo, CA (US);
Albert Redo-Sanchez, Elortz, ES;
Gordon Moseley Andrews, Ross, CA (US);
Ramesh Raskar, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A sample may be illuminated in such a way that light passes through the sample, reflects from a set of reflectors, passes through the sample again and travels to a light sensor. The reflectors may be staggered in depth beneath the sample, each reflector being at a different depth. Light reflecting from each reflector, respectively, may arrive at the light sensor during a different time interval than that in which light reflecting from other reflectors arrives—or may have a different phase than that of light reflecting from the other reflectors. The light sensor may separately measure light reflecting from each reflector, respectively. The reflectors may be extremely small, and the separate reflections from the different reflectors may be combined in a super-resolved image. The super-resolved image may have a spatial resolution that is better than that indicated by the diffraction limit.