The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

Jun. 28, 2018
Applicants:

Robert Bosch Gmbh, Stuttgart, DE;

Akustica, Inc., Pittsburgh, PA (US);

Inventors:

Christoph Hermes, Kirchentellinsfurt, DE;

Bernhard Gehl, Wannweil, DE;

Arnim Hoechst, Reutlingen, DE;

Daniel Meisel, Pittsburgh, PA (US);

Andrew Doller, Sharpsburg, PA (US);

Yujie Zhang, Sunnyvale, CA (US);

Gokhan Hatipoglu, Pittsburgh, PA (US);

Assignees:

Akustica, Inc., Pittsburgh, PA (US);

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 19/04 (2006.01); H04R 19/00 (2006.01); H04R 7/10 (2006.01); H04R 31/00 (2006.01);
U.S. Cl.
CPC ...
H04R 19/04 (2013.01); H04R 7/10 (2013.01); H04R 19/005 (2013.01); B81B 2201/0257 (2013.01); B81B 2203/04 (2013.01); H04R 31/003 (2013.01); H04R 2201/003 (2013.01); H04R 2307/025 (2013.01);
Abstract

A MEMS microphone includes a substrate, a lower membrane supported on the substrate, an upper membrane suspended above the lower membrane, a first electrode supported on the lower membrane, and a second electrode supported on the upper membrane. The lower membrane and the upper membrane enclose a cavity in which the first electrode and the second electrode are located. The lower membrane and the upper membrane are each formed of silicon carbonitride (SiCN). The first electrode and the second electrode are each formed of polysilicon.


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