The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Jan. 26, 2017
Asml Netherlands B.v., Veldhoven, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Güneş Nakiboğlu, Eindhoven, NL;
Rita Marguerite Albin Lambertine Petit, Eindhoven, NL;
Hermen Folken Pen, Vught, NL;
Remco Yuri Van De Moesdijk, Geldrop, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Borgert Kruizinga, Zoetermeer, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.