The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Mar. 05, 2019
Applicant:
Asml Holding N.v., Veldhoven, NL;
Inventor:
Parag Vinayak Kelkar, Danbury, CT (US);
Assignee:
ASML Holding N.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); H01L 21/027 (2006.01); G02B 1/113 (2015.01); H01L 21/311 (2006.01); G02B 1/118 (2015.01); G03F 7/20 (2006.01); G03F 1/46 (2012.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); G02B 1/113 (2013.01); G02B 1/118 (2013.01); G03F 1/46 (2013.01); G03F 7/2008 (2013.01); G03F 7/70958 (2013.01); H01L 21/0276 (2013.01); H01L 21/31138 (2013.01); B82Y 40/00 (2013.01);
Abstract
A substrate provided with an anti-reflective coating where the anti-reflective coating is made up of a layer of nanostructures. The nanostructures may be formed by depositing a material such as SiO2 and then using a process such as reactive ion etching in conjunction with an inductively coupled plasma source. Other aspects of the fabrication process are also disclosed.
Kelkar, Parag. (2021). Anti-reflection optical substrates and methods of manufacture (U.S. Patent No. 11009794). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11009794
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile