The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Nov. 22, 2017
Applicant:
Etamax Co., Ltd, Suwon-si, KR;
Inventors:
Huyndon Jung, Suwon-si, KR;
Youngbeom Kim, Suwon-si, KR;
Assignee:
ETAMAX CO., LTD, Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G01N 21/88 (2006.01); G01N 27/10 (2006.01);
U.S. Cl.
CPC ...
G01N 21/6456 (2013.01); G01N 21/6489 (2013.01); G01N 21/8806 (2013.01); G01N 27/10 (2013.01); G01N 2021/6495 (2013.01); G01N 2021/8845 (2013.01); G01N 2201/0636 (2013.01); G01N 2201/0662 (2013.01); G01N 2201/06113 (2013.01);
Abstract
The present disclosure relates to a substrate defect measuring apparatus for detecting defects inside a substrate by photoluminescence and detecting defects outside the substrate by using the scattering of incident light for generating photoluminescence, and provides an apparatus for constituting an optical system in order to measure scattered and/or reflected light together in a procedure of measuring the photoluminescence, thereby shortening a measurement time.