The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Mar. 06, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Dale R. Du Bois, Los Gatos, CA (US);
Amit Kumar Bansal, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/50 (2006.01); C23C 16/54 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32458 (2013.01); C23C 16/45587 (2013.01); C23C 16/46 (2013.01); C23C 16/50 (2013.01); C23C 16/505 (2013.01); C23C 16/54 (2013.01); H01J 37/3288 (2013.01); H01J 37/32449 (2013.01); H01J 2237/3321 (2013.01);
Abstract
Embodiments described herein provide an apparatus for improving deposition uniformity by improving plasma profile using a tri-cut chamber liner. The apparatus also includes a lid assembly having a split process stack for reducing downtime and a bottom heater support for more efficient heating of chamber walls.
Quick Actions:
Rocha-Alvarez, Juan. (2021). Chamber design for semiconductor processing (U.S. Patent No. 11004663). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11004663
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