The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Dec. 26, 2019
C. Uyemura & Co., Ltd., Osaka, JP;
Masayuki Utsumi, Osaka, JP;
Masaharu Takeuchi, Osaka, JP;
C. Uyemura & Co., Ltd., Osaka, JP;
Abstract
In a flow down type surface treating apparatus, a scattering amount of a processing solution is reduced. A film forming mechanismis provided on an inlet side and an outlet side of each treatment chamber. The film forming mechanismejects a continuous laminar liquid under pressure of about 0.01 MPa at a flow rate of 5 to 10 L/min. Such a liquid film prevents droplets reflected on a surface of an antiscattering memberfrom splashing and entering the adjacent treatment chamber. When a plate-like workis shaken to collide with the liquid film, the film flows down along the plate-like worksince the film formed by the film forming mechanismis liquid. Thereby, a shake of the plate-like workis converged. An amount of air flowing in toward a transport direction in each treatment chamber is reduced.