The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Oct. 31, 2019
Applicant:

Globalfoundries U.s. Inc., Santa Clara, CA (US);

Inventors:

Ahmed Hassan, Sunnyvale, CA (US);

James Culp, New Paltz, NY (US);

Assignee:

GLOBALFOUNDRIES U.S. INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/394 (2020.01); G06F 30/398 (2020.01); H01L 23/538 (2006.01); G01N 21/95 (2006.01); G03F 1/20 (2012.01); G03F 1/70 (2012.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G01N 21/9503 (2013.01); G03F 1/20 (2013.01); G03F 1/70 (2013.01); G06F 30/394 (2020.01); H01J 37/3174 (2013.01); H01L 23/5383 (2013.01);
Abstract

One illustrative system includes a processor and memory storing instructions that, when executed by the processor, cause the system to receive a device layout including a curvilinear feature, define a plurality of vertices for the curvilinear feature, determine a radius of curvature between a selected vertex in the plurality of vertices and a neighboring vertex in the plurality of vertices, and identify a design rule violation for the curvilinear feature responsive to the radius of curvature being less than a predetermined threshold.


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