The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2021
Filed:
Feb. 20, 2020
Applicant:
Hoya Corporation, Tokyo, JP;
Inventors:
Takumi Kobayashi, Tokyo, JP;
Kazuhiro Hamamoto, Tokyo, JP;
Tatsuo Asakawa, Tokyo, JP;
Tsutomu Shoki, Tokyo, JP;
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/40 (2012.01); G03F 1/24 (2012.01); G03F 1/54 (2012.01);
U.S. Cl.
CPC ...
G03F 1/40 (2013.01); G03F 1/24 (2013.01); G03F 1/54 (2013.01);
Abstract
A substrate with an electrically conductive film for fabricating a reflective mask is obtained that is capable of preventing positional shift of the reflective mask during pattern transfer. Provided is a substrate with an electrically conductive film used in lithography, the substrate with an electrically conductive film having an electrically conductive film formed on one of the main surfaces of a mask blank substrate, and a coefficient of static friction of the surface of the electrically conductive film is not less than 0.25.