The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2021

Filed:

Jun. 11, 2018
Applicant:

Ulvac, Inc., Chigasaki, JP;

Inventor:

Hirotoshi Nakao, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65G 17/12 (2006.01); C23C 14/34 (2006.01); B65G 17/32 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01); B65G 49/06 (2006.01);
U.S. Cl.
CPC ...
B65G 17/12 (2013.01); B65G 17/326 (2013.01); B65G 49/061 (2013.01); C23C 14/34 (2013.01); C23C 14/50 (2013.01); C23C 14/568 (2013.01); H01L 21/6776 (2013.01); H01L 21/67109 (2013.01); H01L 21/67706 (2013.01); H01L 21/67715 (2013.01); B65G 2201/022 (2013.01);
Abstract

The present invention provides a technique to enable sufficient space saving in a transit-type vacuum processing device. The vacuum processing deviceof the present invention has: a vacuum chamberwhere a single vacuum ambience is formed; first and second processing regionsandthat are provided in the vacuum chamberand have a processing source that performs processing on a planar process surface of a substrate; and a conveyance drive memberthat forms a conveyance path for conveying the substrateso as to pass through the first and second processing regionsand. The conveyance path is formed as a single annular path when the conveyance path is projected onto a plane (vertical plane) containing: a normal line of an arbitrary point on a process surface of the substrateconveyed through the conveyance path, and a trajectory line drawn by the arbitrary point on the process surface of the substratewhen the substratepasses straight through the first and second processing regionsand


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