Methods of forming vertical field-effect transistor with selfaligned contacts for memory devices with planar periphery/array and intermediate structures formed thereby

Abstract

Methods of forming a memory device having an array portion including a plurality of array transistors and a periphery region including peripheral circuit transistor structures of the memory device, where an upper surface of the periphery region and an upper surface of the array portion are planar (or nearly planar) after formation of the peripheral circuit transistor structures and a plurality of memory cells (formed over the array transistors). The method includes forming the peripheral circuit transistor structures in the periphery region, forming the plurality of array transistors in the array portion and forming a plurality of memory cells over respective vertical transistors. Structures formed by the method have planar upper surfaces of the periphery and array regions.