The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

Oct. 06, 2015
Applicant:

Tel Fsi, Inc., Chaska, MN (US);

Inventors:

Jeffery W. Butterbaugh, Eden Prairie, MN (US);

Chimaobi W. Mbanaso, Chaska, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 5/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/683 (2013.01); B08B 5/04 (2013.01); H01L 21/02041 (2013.01); H01L 21/02043 (2013.01); H01L 21/67051 (2013.01);
Abstract

Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, using a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. The system may include a two-stage gas nozzle that expands the high pressure incoming gas within two inline expansion chambers. However, in other embodiments, the system may include a single stage nozzle design with one expansion component.


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