The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

Jun. 21, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Jyh-Shiou Hsu, Hsin-Chu, TW;

Chi-Ming Yang, Hsinchu, TW;

Tzu Jeng Hsu, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/768 (2006.01); C25D 5/34 (2006.01); C25D 7/12 (2006.01); C23C 28/02 (2006.01); C25D 3/38 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67201 (2013.01); C23C 28/023 (2013.01); C25D 3/38 (2013.01); C25D 5/34 (2013.01); C25D 7/123 (2013.01); H01L 21/6723 (2013.01); H01L 21/76843 (2013.01); H01L 21/76873 (2013.01); H01L 21/76879 (2013.01); H01L 23/53238 (2013.01);
Abstract

A method of manufacturing a semiconductor structure includes loading the substrate from a first load lock chamber into a first processing chamber; disposing a conductive layer over the substrate in the first processing chamber; loading the substrate from the first processing chamber into the first load lock chamber; loading the substrate from the first load lock chamber into an enclosure filled with an inert gas and disposed between the first load lock chamber and a second load lock chamber; loading the substrate from the enclosure into the second load lock chamber; loading the substrate from the second load lock chamber into a second processing chamber; disposing a conductive member over the conductive layer in the second processing chamber; loading the substrate from the second processing chamber into the second load lock chamber; and loading the substrate from the second load lock chamber into a second load port.


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