The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

Sep. 18, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chia-Lun Chen, Taichung, TW;

Po-Jen Shih, Tainan, TW;

Ming-Sung Hung, Taichung, TW;

Wen-Hung Hsu, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 1/04 (2006.01); B08B 3/02 (2006.01); H01L 21/687 (2006.01); H01L 21/304 (2006.01); B08B 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 1/001 (2013.01); B08B 1/007 (2013.01); B08B 1/04 (2013.01); B08B 3/024 (2013.01); H01L 21/0206 (2013.01); H01L 21/304 (2013.01); H01L 21/6704 (2013.01); H01L 21/67051 (2013.01); H01L 21/68728 (2013.01);
Abstract

A semiconductor wafer cleaning apparatus is provided. The semiconductor wafer cleaning apparatus includes a spin base having a through hole. The semiconductor wafer cleaning apparatus further includes a spindle extending through the through hole. The semiconductor wafer cleaning apparatus also includes a clamping member. The clamping member covers the through hole and connected to the spindle. A gap that communicates with the through hole is formed between the spin base and the clamping member. In addition, the semiconductor wafer cleaning apparatus includes a sealing ring. The sealing ring is positioned adjacent to the gap and located farther away from the spindle than the gap.


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