The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2021
Filed:
Apr. 01, 2019
Rigaku Corporation, Akishima, JP;
Hiroshi Kono, Nagaokakyo, JP;
Satoshi Murakami, Kyoto, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
Provided is an X-ray analysis system with which it is possible to set appropriate conditions for vapor phase decomposition with ease. The X-ray analysis system includes an X-ray spectrometer and a vapor phase decomposition apparatus. The X-ray spectrometer includes: an X-ray source configured to irradiate a measurement sample having a thin film present on its surface with primary X-rays; a detector configured to measure an intensity of reflected X-rays, or an intensity of fluorescent X-rays; and a calculation unit configured to calculate a film thickness or a coating mass of the thin film based on the intensity of the reflected X-rays or the fluorescent X-rays. The vapor phase decomposition apparatus includes: a vapor phase decomposition portion configured to perform vapor phase decomposition on the thin film; and a control portion configured to determine a vapor phase decomposition time based on the film thickness or the coating mass.