The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Aug. 27, 2019
Applicant:
Ontos Equipment Systems, Chester, NH (US);
Inventor:
Eric Frank Schulte, Santa Barbara, CA (US);
Assignee:
ONTOS Equipment Systems, Inc., Chester, NH (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/288 (2006.01); C25D 5/02 (2006.01); C25D 5/34 (2006.01); C25D 7/12 (2006.01); H01L 21/02 (2006.01); C25D 17/00 (2006.01); H01L 21/027 (2006.01); H01L 21/3105 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2885 (2013.01); C25D 5/022 (2013.01); C25D 5/34 (2013.01); C25D 7/12 (2013.01); C25D 7/123 (2013.01); C25D 17/00 (2013.01); H01L 21/0206 (2013.01); H01L 21/02068 (2013.01); H01L 21/0273 (2013.01); H01L 21/31058 (2013.01); H01L 21/76879 (2013.01); H01L 21/76885 (2013.01);
Abstract
Methods and systems for using the downstream active residuals of a reducing-chemistry atmospheric plasma to provide multiple advantages to pre-plating surface preparation with a simple apparatus. As the downstream active species of the atmospheric plasma impinge the substrate surface, three important surface preparation processes can be performed simultaneously: