The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Oct. 09, 2016
Beijing Naura Microelectronics Equipment Co., Ltd, Beijing, CN;
Jun Zhang, Beijing, CN;
Boyu Dong, Beijing, CN;
Jinrong Zhao, Beijing, CN;
Xuewei Wu, Beijing, CN;
Bingliang Guo, Beijing, CN;
Baogang Xu, Beijing, CN;
Henan Zhang, Beijing, CN;
Tong Wang, Beijing, CN;
Shaohui Liu, Beijing, CN;
Jun Wang, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to load a substrate. The second chamber is configured to provide a high temperature environment in which a degas process and a sputtering process are performed on the substrate. The third chamber is provided between the first chamber and the second chamber. The third chamber is configured to transfer the substrate from the first chamber to the second chamber via the third chamber.