The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Dec. 06, 2019
Applicant:
Carl Zeiss Microscopy Gmbh, Jena, DE;
Inventor:
Erik Essers, Aalen, DE;
Assignee:
Carl Zeiss Microscopy GmbH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/12 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/12 (2013.01); H01J 37/28 (2013.01); H01J 2237/006 (2013.01); H01J 2237/244 (2013.01); H01J 2237/2801 (2013.01);
Abstract
A particle beam system for examining and processing an object includes an electron beam column and an ion beam column with a common work region, in which an object may be disposed and in which a principal axis of the electron beam column and a principal axis of the ion beam column meet at a coincidence point. The particle beam system further includes a shielding electrode that is disposable between an exit opening of the ion beam column and the coincidence point. The shielding electrode is able to be disposed closer to the coincidence point than the electron beam column.