The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Apr. 10, 2019
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventor:

Tzu-Yi Hung, Kaohsiung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H02H 9/04 (2006.01);
U.S. Cl.
CPC ...
H02H 9/046 (2013.01); H01L 27/0248 (2013.01); H01L 27/0259 (2013.01);
Abstract

An electrostatic discharge protection device includes a substrate, a high-voltage N-well region, and a high-voltage P-well region. The substrate includes a first area and a second area which surrounds the first area. The first area is disposed on the high-voltage N-well region and includes a first doped region having a first conductivity type, a second doped region having a second conductivity type which surrounds the first doped region, and a third doped region having the first conductivity type which surrounds the second doped region. The second area is disposed on the high-voltage P-well region and includes a plurality of fourth doped regions having the second conductivity type and a fifth doped region having the first conductivity type. The plurality of fourth doped regions are arranged at intervals and surround the first area. The fifth doped region surrounds the first area and each of the plurality of fourth doped regions.


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