The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Jan. 28, 2008
Applicants:
Jeffrey M. Calvert, Acton, MA (US);
Joseph F. Lachowski, Sutton, MA (US);
Inventors:
Jeffrey M. Calvert, Acton, MA (US);
Joseph F. Lachowski, Sutton, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0236 (2013.01); G03F 7/023 (2013.01); G03F 7/38 (2013.01);
Abstract
Photoresist compositions are provided comprising a radiation sensitive component and at least two distinct novolak resins. In one aspect, photoresists of the invention exhibit notably high dissolution rates, such as in excess of 800 angstroms per second in aqueous developer solution. In another aspect, photoresists of the invention can exhibit good photospeeds, such as 100 mJ/cmor less.