The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Jan. 30, 2019
Applicant:

Xi'an Jiaotong University, Xi'an, CN;

Inventors:

Zhiwei Shan, Xi'an, CN;

Huanhuan Lu, Xi'an, CN;

Ju Li, Cambridge, MA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 19/02 (2006.01); G01N 3/06 (2006.01);
U.S. Cl.
CPC ...
G01N 19/02 (2013.01); G01N 3/066 (2013.01); G01N 2203/005 (2013.01); G01N 2203/0635 (2013.01);
Abstract

A measurement apparatus for micro- and nano-scale materials and a measurement method thereof are provided. The measurement apparatus for the micro- and nano-scale material includes a transmission electron microscope to generate a magnetic field, and a conductive flat punch and a sample which are arranged in the magnetic field. The sample includes the micro- and nano-scale materials. When the current passes through the sample and the conductive flat punch, the conductive flat punch deflects laterally relative to the sample with controllable displacement driven by the electromagnetic force. The required lateral displacement of the present invention is controllable, so that the utilization rate of equipment is greatly increased, and the cost is reduced. In addition, the whole test is performed in the transmission electron microscope, so that a measurement process can be observed in real time.


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