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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10975465 B1

PDFFull Text
Date of Patent:
Apr. 13, 2021

Filed:

Jan. 25, 2017

Method of forming internal stress control film

Applicant:

Ulvac, Inc., Chigasaki, JP;

Inventors:

Katsuaki Nakano, Chigasaki, JP;

Daisuke Hiramatsu, Chigasaki, JP;

Yukinobu Numata, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki, JP;

Attorney:

Grossman, Tucker, Perreault & Pfleger, PLLC

Primary Examiner:

Bret P Chen

Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01L 21/285 (2006.01); C23C 14/00 (2006.01); H01L 21/768 (2006.01); C23C 14/35 (2006.01); H01L 21/3205 (2006.01); C23C 14/06 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
C23C 14/345 (2013.01); C23C 14/0042 (2013.01); C23C 14/0641 (2013.01); C23C 14/3492 (2013.01); C23C 14/35 (2013.01); H01L 21/0337 (2013.01); H01L 21/285 (2013.01); H01L 21/3205 (2013.01); H01L 21/768 (2013.01);
Abstract

A method of forming an internal stress control film on one surface of an object to be processed by a sputtering method, includes selecting a pressure of a process gas at the time of forming the internal stress control film from a pressure region higher than a threshold value of 5 (Pa) so that stress of the object to be processed when a bias is applied to the object to be processed becomes larger stress on a tensile side and the internal stress control film has higher density, as compared with stress in a case in which a bias is not applied thereto.

Find Patent Forward Citations

Nakano, Katsuaki. (2021). Method of forming internal stress control film (U.S. Patent No. 10975465). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10975465

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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