The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2021

Filed:

Nov. 01, 2018
Applicant:

Gigaphoton Inc., Tochigi, JP;

Inventors:

Natsushi Suzuki, Oyama, JP;

Osamu Wakabayashi, Oyama, JP;

Hiroaki Tsushima, Oyama, JP;

Masanori Yashiro, Oyama, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/036 (2006.01); H01S 3/104 (2006.01); H01S 3/225 (2006.01); B01D 53/34 (2006.01); B01D 53/82 (2006.01); H01S 3/23 (2006.01); B01D 53/04 (2006.01); B01D 53/68 (2006.01); B01D 53/86 (2006.01);
U.S. Cl.
CPC ...
H01S 3/036 (2013.01); B01D 53/0446 (2013.01); B01D 53/346 (2013.01); B01D 53/685 (2013.01); B01D 53/82 (2013.01); B01D 53/86 (2013.01); H01S 3/104 (2013.01); H01S 3/225 (2013.01); H01S 3/2366 (2013.01); B01D 2251/404 (2013.01); B01D 2251/602 (2013.01); B01D 2253/108 (2013.01); B01D 2255/20753 (2013.01); B01D 2255/20761 (2013.01); B01D 2257/2027 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/40003 (2013.01);
Abstract

A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.


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