The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Sep. 10, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ryou Son, Miyagi, JP;
Ryouhei Satou, Miyagi, JP;
Yuichi Kuwahara, Miyagi, JP;
Syuntaro Tawaraya, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32899 (2013.01); H01J 37/32192 (2013.01); H01L 21/67069 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates plasma in a lower region thereof, a structure holding ring that is fixed around the upper structure, an arm that supports the ring and is movable up and down, a screw (including a bolt) that is fixed to one of the ring and the arm, and has a tip end abutting the other, and a pin that is provided in the ring or the arm, and passes through a hole for restricting horizontal movement of the ring.