The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Jul. 13, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventor:
Arpit Yati, Lucknow, IN;
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06K 9/62 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); G06N 20/00 (2019.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06K 9/6267 (2013.01); G06N 20/00 (2019.01); G06T 7/001 (2013.01); H01L 21/67288 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01);
Abstract
A deep learning algorithm is used for defect discovery, such as for semiconductor wafers. A care area is inspected with the wafer inspection tool. The deep learning algorithm is used to identify and classify defects in the care area. This can be repeated for remaining care areas, but similar care areas may be skipped to increase throughput.