The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Aug. 28, 2019
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Jian-Sing Li, Hsinchu, TW;
Ting-Wei Chiang, New Taipei, TW;
Hui-Zhong Zhuang, Kaohsiung, TW;
Jung-Chan Yang, Longtan Township, TW;
Li-Chun Tien, Tainan, TW;
Ting Yu Chen, Hsinchu, TW;
Tzu-Ying Lin, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A method includes positioning a first active region adjacent to a pair of second active regions in an initial integrated circuit (IC) layout diagram of an initial cell, to align side edges of the first active region and corresponding side edges of each second active region of the pair of second active regions along a cell height direction. The method further includes arranging at least one first fin feature in the first active region, to obtain a modified cell having a modified IC layout diagram. The side edges of the first active region and the corresponding side edges of each second active region extend along the cell height direction. A height dimension of the first active region in the cell height direction is less than half of a height dimension of each second active region of the pair of second active regions in the cell height direction. At least one of the positioning the first active region or the arranging the at least one first fin feature is executed by a processor.