The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

Oct. 02, 2018
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Gang Chen, San Jose, CA (US);

Yuanwei Zheng, San Jose, CA (US);

Qin Wang, San Jose, CA (US);

Cunyu Yang, Milpitas, CA (US);

Guannan Chen, San Carlos, CA (US);

Duli Mao, Sunnyvale, CA (US);

Dyson Tai, San Jose, CA (US);

Lindsay Grant, Campbell, CA (US);

Eric Webster, Mountain View, CA (US);

Sing-Chung Hu, San Jose, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H04N 5/378 (2011.01); H04N 9/04 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14614 (2013.01); H01L 27/14645 (2013.01); H01L 27/14689 (2013.01); H04N 5/378 (2013.01); H04N 9/0455 (2018.08);
Abstract

An image sensor includes one or more photodiodes disposed in a semiconductor material to receive image light and generate image charge, and a floating diffusion to receive the image charge from the one or more photodiodes. One or more transfer transistors is coupled to transfer image charge in the one or more photodiodes to the floating diffusion, and a source follower transistor is coupled to amplify the image charge in the floating diffusion. The source follower includes a gate electrode (coupled to the floating diffusion), source and drain electrodes, and an active region disposed in the semiconductor material between the source and drain electrodes. A dielectric material is disposed between the gate electrode and the active region and has a first thickness and a second thickness. The second thickness is greater than the first thickness, and the second thickness is disposed closer to the drain electrode than the first thickness.


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