The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Mar. 05, 2020
Toto Ltd., Kitakyushu, JP;
Tetsuro Itoyama, Kitakyushu, JP;
Jumpei Uefuji, Kitakyushu, JP;
Toto Ltd., Fukuoka, JP;
Abstract
According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.