The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 2021

Filed:

May. 11, 2018
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Ryo Muramoto, Kyoto, JP;

Mitsukazu Takahashi, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/6715 (2013.01);
Abstract

A top plate when located at a first position is held by an opposing-member holder, and the top plate when located at a second position is held by a substrate holder and rotated along with the substrate holder. In a substrate processing apparatus, a first processing liquid nozzle located at a supply position inside a to-be-held part of the top plate supplies a first processing liquid through an opposing-member opening to a substrate and is moved from the supply position to its retracted position, and a second processing liquid nozzle is moved from its retracted position to the supply position and supplies a second processing liquid through the opposing-member opening to the substrate. This configuration suppresses or prevents mixture of multiple types of processing liquids, as compared with the case where multiple types of processing liquids are sequentially supplied from a single processing liquid nozzle.


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