The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Dec. 19, 2017
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventor:
Matthew S. Thorum, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B81C 1/00 (2006.01); B08B 1/00 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 1/00 (2013.01); B08B 3/08 (2013.01); B81C 1/00849 (2013.01); H01L 21/67034 (2013.01); B81C 2201/0109 (2013.01);
Abstract
The present disclosure includes apparatuses and methods related to sublimation in forming a semiconductor. In an example, a method may include forming a sacrificial material in an opening of a structure, wherein the sacrificial material displaces a solvent used in a wet clean operation and removing the sacrificial material via sublimation by exposing the sacrificial material to sub-atmospheric pressure.