The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Nov. 12, 2019
The Institute of Optics and Electronics, the Chinese Academy of Sciences, Sichuan, CN;
Fuchao Xu, Sichuan, CN;
Haiyang Quan, Sichuan, CN;
Taotao Fu, Sichuan, CN;
Xiaochuan Hu, Sichuan, CN;
Xi Hou, Sichuan, CN;
Sheng Li, Sichuan, CN;
Abstract
A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile