The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Jan. 09, 2020
Applicants:
Gelest Technologies, Inc., Morrisville, PA (US);
Alain E. Kaloyeros, Slingerlands, NY (US);
Inventors:
Barry C. Arkles, Pipersville, PA (US);
Alain E. Kaloyeros, Slingerlands, NY (US);
Assignee:
GELEST TECHNOLOGIES, INC., Morrisville, PA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/16 (2006.01); C23C 16/46 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/0245 (2013.01); C23C 16/16 (2013.01); C23C 16/45553 (2013.01); C23C 16/46 (2013.01);
Abstract
A thin film deposition process is provided. The process includes, in a single cycle, providing a precursor in the vapor phase with or without a carrier gas to a reaction zone containing a substrate, such that a monolayer of the precursor is adsorbed to a surface of the substrate and the adsorbed monolayer subsequently undergoes conversion to a discrete atomic or molecular layer of a thin film, without any intervening pulse of or exposure to other chemical species or co-reactants.