The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Nov. 13, 2019
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Moshe Amzaleg, Beer Sheva, IL;
Ofer Adan, Rehovot, IL;
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G05B 19/406 (2006.01); G06T 7/00 (2017.01); G06T 7/60 (2017.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/66 (2006.01); G01N 21/95 (2006.01); G01B 15/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67288 (2013.01); G01N 21/9503 (2013.01); G05B 19/406 (2013.01); G06T 7/0004 (2013.01); G06T 7/60 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); H01L 21/31116 (2013.01); H01L 21/67069 (2013.01); H01L 22/12 (2013.01); G01B 15/08 (2013.01); G05B 2219/32179 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A system, computer program product and a method for detecting manufacturing process defects, the method may include: obtaining multiple edge measurements of one or more structural elements after a completion of each one of multiple manufacturing phases; generating spatial spectrums, based on the multiple edge measurements, for each one of the multiple manufacturing phases; determining relationships between bands of the spatial spectrums; and identifying at least one of the manufacturing process defects based on the relationships between the bands of the spatial spectrums.