The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Apr. 26, 2018
Ebara Corporation, Tokyo, JP;
Hidetatsu Isokawa, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate processing apparatus is disclosed. In an embodiment, a substrate processing apparatus includes a plurality of polishing units including discharge valves that can discharge water at a predetermined flow rate, a plurality of cleaning units including discharge valves that discharges water at a predetermined flow rate, and a controller that controls opening and closing of the discharge valve of each of the plurality of polishing units and the plurality of cleaning units, and the controller controls opening and closing of the discharge valves of the plurality of polishing units and the plurality of cleaning units based on predetermined priority orders allocated to the plurality of polishing units and the plurality of cleaning units, so that the total discharge flow rate from the plurality of polishing units and the plurality of cleaning units is a predetermined flow rate or less.