The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Sep. 04, 2018
Applicant:
Globalfoundries U.s. Inc., Santa Clara, CA (US);
Inventors:
Ruilong Xie, Niskayuna, NY (US);
Vimal Kamineni, Mechanicville, NY (US);
Shesh Mani Pandey, Saratoga Springs, NY (US);
Hui Zang, Guilderland, NY (US);
Assignee:
GLOBALFOUNDRIES U.S. Inc., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/532 (2006.01); H01L 29/06 (2006.01); H01L 27/088 (2006.01); H01L 21/768 (2006.01); H01L 21/764 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0653 (2013.01); H01L 21/764 (2013.01); H01L 21/76897 (2013.01); H01L 21/823431 (2013.01); H01L 27/0886 (2013.01);
Abstract
One device disclosed herein includes, among other things, first and second active regions, a first source/drain contact positioned above the first active region, a second source/drain contact positioned above the second active region, and a dielectric material disposed between the first and second source/drain contacts, wherein the dielectric material defines an air gap cavity positioned between the first and second source/drain contacts.