The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Jan. 12, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Wataru Adachi, Kawasaki, JP;
Kazuo Sato, Kawasaki, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/505 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/4404 (2013.01); C23C 16/4582 (2013.01); C23C 16/505 (2013.01); H01J 37/32449 (2013.01); H01J 37/32715 (2013.01); H01L 21/67161 (2013.01); H01L 21/68764 (2013.01); H01L 21/68792 (2013.01);
Abstract
Examples of a substrate processing apparatus includes a chamber, a susceptor provided in the chamber, a flow control ring of an insulator that is mounted on the chamber and surrounds the susceptor, a shower plate opposed to the susceptor, and a metal film that is formed on a lower surface of the flow control ring while exposing an upper surface of the flow control ring, and is in contact with the chamber.