The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Dec. 04, 2019
Tokyo Electron Limited, Tokyo, JP;
Koichi Tateshita, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
According to one embodiment of the present disclosure, there is provided a plasma processing apparatus for performing plasma processing on a substrate in a processing container, the plasma processing apparatus comprising: an upper electrode; a power feeding rod; a gas diffusion plate having a plurality of ejection holes and disposed below the upper electrode; a gas introduction member; an insulation introduction member; a plurality of gas supply paths; and a confluence provided directly below a connection between the upper electrode and the power feeding rod, and configured to cause the processing gas from the gas supply paths to merge, wherein the processing gas after merging in the confluence flows in a space that is formed above the gas diffusion plate and communicating with the ejection holes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile