The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
May. 21, 2019
Applicant:
Nuflare Technology, Inc., Yokohama, JP;
Inventor:
Noriaki Nakayamada, Kamakura, JP;
Assignee:
NuFlare Technology, Inc., Yokohama, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/304 (2006.01); H01J 37/302 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 37/244 (2013.01); H01J 37/304 (2013.01); H01J 37/3023 (2013.01); H01J 2237/24564 (2013.01);
Abstract
An electron beam irradiation method includes calculating a charge amount distribution in the case where a substrate is irradiated with an electron beam, by using an index indicating complexity of a pattern to be formed on the substrate, calculating a positional deviation amount of an irradiation pattern to be formed due to irradiation with the electron beam, by using the charge amount distribution having been calculated, correcting an irradiation position by using the positional deviation amount having been calculated, and applying an electron beam to the irradiation position having been corrected.