The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2021

Filed:

May. 03, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Choonshik Leem, Seoul, KR;

Taelim Choi, Seoul, KR;

Yongdeok Kim, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 3/40 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 3/4046 (2013.01); G06T 3/4053 (2013.01); G06T 7/0004 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A non-transitory computer-readable medium for monitoring a semiconductor fabrication process includes an image conversion model having an artificial neural network. The image conversion model, when executed, causes the processor to receive a first image and a second image of a semiconductor wafer. The artificial neural network is trained by inputting a dataset representing the first image and the second image, generating a conversion image of the semiconductor wafer and calibrating weights and biases of the artificial neural network to match the conversion image to the second image. A third image of the semiconductor wafer is generated based on the calibrated weights and biases of the artificial neural network. The image conversion model with the trained artificial neural network may be transmitted to another device for image conversion of low resolution images.


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