The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Dec. 20, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jeffrey Drue David, San Jose, CA (US);
Harry Q. Lee, Los Altos, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Boguslaw A. Swedek, Cupertino, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); B24B 37/20 (2012.01); B24B 49/12 (2006.01); B24B 37/04 (2012.01);
U.S. Cl.
CPC ...
G05B 19/418 (2013.01); B24B 37/042 (2013.01); B24B 37/205 (2013.01); B24B 49/12 (2013.01); G05B 2219/45232 (2013.01);
Abstract
A method to assist in identifying a spectral feature and a characteristic of the selected spectral feature to monitor during polishing includes polishing a test substrate and measuring a sequence of spectra of light reflected from a substrate while the substrate is being polished, where at least some of the spectra of the sequence differ due to material being removed during the polishing. The sequence of spectra are visually displayed as a contour plot.