The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Mar. 06, 2018
Asml Netherlands B.v., Veldhoven, NL;
Nick Kant, Utrecht, NL;
Robertus Martinus Alphonsus Van Herpen, Eindhoven, NL;
Mark Louwrens Beks, Eindhoven, NL;
Lense Hendrik-Jan Maria Swaenen, Hoogstraten, BE;
Nico Vanroose, Borgerhout, BE;
James Robert Downes, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.